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FloTron :: Multi-channel Plasma Emission Monitoring and Reactive Gas Control

FloTron main page x3. FloTron X is an extended range (200 - 1040 nm) fast spectrometer-based multiple channel process control system for technological plasma-based processes, such as reactive magnetron sputtering. FloT. FloTron H - a hybrid system that combines two optical monitoring technologies, a CCD-based spectrometer input and photomultiplier tube inputs with narrow bandpass filters. FloTron H thus provides. Process control, monitoring, development and optimisation.

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FloTron :: Multi-channel Plasma Emission Monitoring and Reactive Gas Control | flotron.net Reviews
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FloTron main page x3. FloTron X is an extended range (200 - 1040 nm) fast spectrometer-based multiple channel process control system for technological plasma-based processes, such as reactive magnetron sputtering. FloT. FloTron H - a hybrid system that combines two optical monitoring technologies, a CCD-based spectrometer input and photomultiplier tube inputs with narrow bandpass filters. FloTron H thus provides. Process control, monitoring, development and optimisation.
<META>
KEYWORDS
1 contacts
2 systems
3 accessories
4 software
5 flotron x
6 flotron h
7 flotron
8 flotron configuration guide
9 applications
10 reactive magnetron sputtering
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contacts,systems,accessories,software,flotron x,flotron h,flotron,flotron configuration guide,applications,reactive magnetron sputtering,advice,sales representatives,reactive sputtering,vacuum coating
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FloTron :: Multi-channel Plasma Emission Monitoring and Reactive Gas Control | flotron.net Reviews

https://flotron.net

FloTron main page x3. FloTron X is an extended range (200 - 1040 nm) fast spectrometer-based multiple channel process control system for technological plasma-based processes, such as reactive magnetron sputtering. FloT. FloTron H - a hybrid system that combines two optical monitoring technologies, a CCD-based spectrometer input and photomultiplier tube inputs with narrow bandpass filters. FloTron H thus provides. Process control, monitoring, development and optimisation.

INTERNAL PAGES

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1

Plasma Enhanced CVD (PECVD) and Plasma Etching | FloTron :: Multi-channel Plasma Emission Monitoring and Reactive Gas Control

http://www.flotron.net/node/85

Plasma Enhanced CVD (PECVD) and Plasma Etching. Mon, 2012-02-27 17:16. FloTron : Multi-channel Plasma Emission Monitoring and Reactive Gas Control 2016 Disclaimer.

2

FLOTRON™ X | FloTron :: Multi-channel Plasma Emission Monitoring and Reactive Gas Control

http://www.flotron.net/flotron-x-system

By Nova Fabrica Ltd. FloTron : Multi-channel Plasma Emission Monitoring and Reactive Gas Control 2016 Disclaimer.

3

Accessories | FloTron :: Multi-channel Plasma Emission Monitoring and Reactive Gas Control

http://www.flotron.net/accessories

Essentially all sensor types used for reactive deposition (magnetron sputtering or evaporation) are geared towards direct or indirect gas and/or vapour composition analysis, monitoring and provision of feedback signals. On the basis of these feedback signals control signals for actuating devices (e.g. mass flow controllers and power supplies) are derived. The following sensor technologies are currently available to use with FloTron systems:. Remote plasma (RP) sensor head,.

4

FLOTRON™ | FloTron :: Multi-channel Plasma Emission Monitoring and Reactive Gas Control

http://www.flotron.net/flotron-system

FloTron is a high speed multiple channel process control system for reactive magnetron sputtering and ion/plasma processing. FloTron systems can be configured for single or multiple (2 to 7) zone large area processing, and are therefore well suitable for both R&D and manufacturing. By Nova Fabrica Ltd. FloTron : Multi-channel Plasma Emission Monitoring and Reactive Gas Control 2016 Disclaimer.

5

FloTron :: Multi-channel Plasma Emission Monitoring and Reactive Gas Control

http://www.flotron.net/about

3 fast spectrometer-based models: X3, X5 and X9. Multiple spectrometer versions; single or multiple zone reactive sputtering process control. Industrial communication interfaces for OEM clients. Proprietary PID and PDF algorithms to suite the taste of any process control engineer. What do you think about FloTron.net? Needs to be improved. FloTron : Multi-channel Plasma Emission Monitoring and Reactive Gas Control 2016 Disclaimer.

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Basic Concepts of Reactive Sputtering | Reactive Sputtering

http://www.reactive-sputtering.info/node/99

Basic Concepts of Reactive Sputtering. Mon, 2013-01-28 23:05. Definition: Reactive Sputtering is a process where a target of one chemical composition (e.g. elemental Si) is sputtered in the presence of a gas or a mixture of gasses (e.g. Ar O. That will react with the target material to form a coating of a different chemical composition (e.g. compound SiO. The driving force behind the widespread use of this technology is the fact that operation in the so called ‘transition’ region (explained in the later ...

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FloTron :: Multi-channel Plasma Emission Monitoring and Reactive Gas Control

FloTron main page x3. FloTron X is an extended range (200 - 1040 nm) fast spectrometer-based multiple channel process control system for technological plasma-based processes, such as reactive magnetron sputtering. FloT. FloTron H - a hybrid system that combines two optical monitoring technologies, a CCD-based spectrometer input and photomultiplier tube inputs with narrow bandpass filters. FloTron H thus provides. Process control, monitoring, development and optimisation.

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