lumarray.com
LumArray | Maskless Optical LithographyLumArray is a lithography company with a state-of-the-art-patented technology, developed at Massachusetts Institute of Technology (MIT).
http://www.lumarray.com/
LumArray is a lithography company with a state-of-the-art-patented technology, developed at Massachusetts Institute of Technology (MIT).
http://www.lumarray.com/
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15 ●●● ST
SOM●●●LLE , MA, 02143
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FENG ZHANG
15 ●●● ST
SOM●●●LLE , MA, 02143
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FENG ZHANG
15 ●●● ST
SOM●●●LLE , MA, 02143
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LumArray | Maskless Optical Lithography | lumarray.com Reviews
https://lumarray.com
LumArray is a lithography company with a state-of-the-art-patented technology, developed at Massachusetts Institute of Technology (MIT).
lumarray.com
LumArray | Maskless Optical Lithography
http://www.lumarray.com/tech.htm
LumArray, Inc. is developing a maskless photolithography system, the ZP-150, based on zone-plate-array lithography (ZPAL), a technology invented and developed initially in the NanoStructures Laboratory at MIT between 1999 and 2006. Figure 1 illustrates schematically the basic components and operating principle of the ZP-150. Further details on the early development of ZPAL and LumArray’s ZP-150 can be found in the following references. 4] D Gil, D.J.D. Carter, R. Menon, X. Tang and H&...5] D Gil, R. ...
LumArray | Maskless Optical Lithography
http://www.lumarray.com/news.htm
LumArray receives contract from Department of Energy. February 18, 2014. Under SBIR DE-FOA-0000969, LumArray will develop ultra-low distortion diffraction gratings and diffractive optics for use in high-energy spectrometers and monochromators on synchrotron and free-electron laser beamlines at DOE laboratories across the country. At the Workshop Enabling Nanofabriation for Rapid Innovation. August 18-21, 2013. ENRI 2013 Workshop - August 18-21, 2013 - Napa, California, USA. May 28, 2013.
LumArray | Maskless Optical Lithography
http://www.lumarray.com/products.htm
Affordable high-throughput, high-resolution, maskless photolithographic patterning for research, product development and low-volume or customized manufacturing. 200 nm with 0.85 NA lens array. 600 nm with 0.30 NA lens array. Number of Parallel Beams:. 17 mm2/sec, 100 mm2/min @. NA=085, 200 nm features. Process-dependent; increases in throughput are possible at lower resolution. Optimized 8-bit grayscale in every pixel. Up to 150mm x 150 mm. 405nm (I-line, G-line compatible). Particulates to ISO Class 5,.
LumArray | Maskless Optical Lithography
http://www.lumarray.com/services.htm
LumArray, offers microlithographic services to complement our manufacturing of maskless photolithography systems. Lithographic service is available using either our in-house ZP-150 maskless photolithography system. Or our Raith 150 scanning-electron-beam-lithography (SEBL) system. The ZP-150 can write dense features down to 200 nm linewidth and cover substrates up to 150 mm diameter with a single continuous pattern, i.e., without stitching. Figure 1 is an example of a pattern written on our ZP-150 system.
LumArray | Maskless Optical Lithography
http://www.lumarray.com/company.htm
Lumarray is developing a maskless photolithography system that departs from the conventional by employing an array of microlenses rather than a single projector. Our technology, Zone-Plate-Array Lithography (ZPAL), developed originally at MIT, integrates advances in microfabrication, micromechanics,high-speed computation and auto correction to produce a lithography tool that will accelerate innovation in micro- and nanotechnologies, from electronics and photonics to materials science and the life sciences.
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Artwork Conversion Company Profile
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Artwork Conversion Company Profile. Artwork Conversion Software, Inc. AutoDesk 3rd Party Developer. SOLIDWORKS Certified Solution Provider. Over 5000 customers worldwide including Alcatel, AMD, Applied Materials, Agere, Bosch, KLA Tencor, Motorola, Ericsson, General Electric, Hewlett Packard, Hitachi, Lockheed Martin, Photronics, Siemens, Seagate, Sony, TRW . Mann and Electromask (PG). MEBES (e-beam mask writer). OASIS (2nd gen GDSII). Archive (EGS and HP ADS). Gerber (274D, 274X, Pentax). Ansys is a lea...
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ACIDOS GRASOS Y ORGANICOS. PAQUETES PARA LUBRICANTES INDUSTRIALES. Ingredientes y servicios para la formulacià n. De lubricantes y fluidos industriales. Lumar QuÃmica es una empresa especializada en aditivos quÃmicos, fluidos base y servicios para la formulacià n de lubricantes, detergentes y fluidos industriales. Nuestra misià n es ayudar a nuestros clientes a ser mà s competitivos y por eso les ofrecemos:. Una amplia gama de especialidades quÃmicas y fluidos base.
LumArray | Maskless Optical Lithography
News block for home. Feb 18, 2014. LumArray receives contract from Department of Energy. LumArray will develop ultra-low distortion diffraction gratings and diffractive optics for use at DOE laboratories across the country. Aug 18-21, 2013. At the Workshop Enabling Nanofabriation for Rapid Innovation. Held at Silverado Resort, Napa, California, Dr. Michael Walsh presented a paper entitled: Maskless Photolithography: Changing the Game in Micro and Nano Manufacturing.
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