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Monday, 1 February 2010. Technology Headlines – 02 November 2009. ASML/Brion contract with Chartered: Brion Technologies has reached a multi-year agreement with Chartered Semiconductor, to implement a broad suite of computational lithography products. Chartered will use Tachyon™ OPC (optical proximity correction), Tachyon LMC (lithography manufacturability check), and Tachyon resolution enhancement products to design and manufacture 45-nanometer (nm) and below technology node devices (ASML). Infineon/TSM...

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Monday, 1 February 2010. Technology Headlines – 02 November 2009. ASML/Brion contract with Chartered: Brion Technologies has reached a multi-year agreement with Chartered Semiconductor, to implement a broad suite of computational lithography products. Chartered will use Tachyon™ OPC (optical proximity correction), Tachyon LMC (lithography manufacturability check), and Tachyon resolution enhancement products to design and manufacture 45-nanometer (nm) and below technology node devices (ASML). Infineon/TSM...
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Semi news | seminews-gp.blogspot.com Reviews

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Monday, 1 February 2010. Technology Headlines – 02 November 2009. ASML/Brion contract with Chartered: Brion Technologies has reached a multi-year agreement with Chartered Semiconductor, to implement a broad suite of computational lithography products. Chartered will use Tachyon™ OPC (optical proximity correction), Tachyon LMC (lithography manufacturability check), and Tachyon resolution enhancement products to design and manufacture 45-nanometer (nm) and below technology node devices (ASML). Infineon/TSM...

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Semi news: February 2010

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Monday, 1 February 2010. Technology Headlines – 02 November 2009. ASML/Brion contract with Chartered: Brion Technologies has reached a multi-year agreement with Chartered Semiconductor, to implement a broad suite of computational lithography products. Chartered will use Tachyon™ OPC (optical proximity correction), Tachyon LMC (lithography manufacturability check), and Tachyon resolution enhancement products to design and manufacture 45-nanometer (nm) and below technology node devices (ASML). Infineon/TSM...

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Semi news: to Feb 2010

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Monday, 1 February 2010. Technology Headlines – 02 November 2009. ASML/Brion contract with Chartered: Brion Technologies has reached a multi-year agreement with Chartered Semiconductor, to implement a broad suite of computational lithography products. Chartered will use Tachyon™ OPC (optical proximity correction), Tachyon LMC (lithography manufacturability check), and Tachyon resolution enhancement products to design and manufacture 45-nanometer (nm) and below technology node devices (ASML). Infineon/TSM...

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Monday, 1 February 2010. Technology Headlines – 02 November 2009. ASML/Brion contract with Chartered: Brion Technologies has reached a multi-year agreement with Chartered Semiconductor, to implement a broad suite of computational lithography products. Chartered will use Tachyon™ OPC (optical proximity correction), Tachyon LMC (lithography manufacturability check), and Tachyon resolution enhancement products to design and manufacture 45-nanometer (nm) and below technology node devices (ASML). Infineon/TSM...

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