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Synopsys - Former SigmaC | sigma-c.de Reviews

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Semiconductors: Deposition Process in Semiconductor Manufacturing

http://microchiptech.blogspot.com/2006/10/deposition-process-in-semiconductor.html

Monday, October 16, 2006. Deposition Process in Semiconductor Manufacturing. For the deposition of conducting and insulating materials in semiconductor processing, a wide range of different techniques is used. Among them, physical vapor deposition (PVD) and chemical vapor deposition (CVD) are the most important ones. Materials in semiconductor manufacturing that can be deposited by CVD are for example: Silicon dioxide, silicon nitride, polysilicon, tungsten, copper, titanium nitride, aluminum.

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Semiconductors: October 2006

http://microchiptech.blogspot.com/2006_10_01_archive.html

Monday, October 16, 2006. Ion Implantation Process in Semiconductor Manufacturing. Main advantages of ion implantation (in comparison to diffusion) for the doping of semiconductors are:. Short process times, good homogeneity and reproducibility of the profiles. Exact control of the amount of implanted ions by integrating the current. This is of particular importance for low concentrations, e.g. for adjusting the threshold voltage of MOS transistors. Relatively low temperatures during the process. Diffusi...

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